Extreme ultraviolet laser

Extreme ultraviolet laser. Sep 25, 2023 · X-ray free-electron lasers and high-harmonic-generation sources of extreme-ultraviolet (EUV) to hard X-ray photons deliver intense ultrashort pulses and enable the extension of nonlinear Feb 27, 2023 · A laser pulse surfing in the wake of an electron beam pulse could get upshifted from visible to extreme ultraviolet light, simulations done at the University of Michigan have shown. The reflectivity at 46. As Extreme Ultraviolet (EUV) lithography has become the most advanced lithography technology applied in the semiconductor manufacturing industry, corresponding EUV photoresists have also developed significantly in recent years. The photoionization of different rare gases was compared at the free-electron laser in Hamburg, FLASH, by applying ion spectroscopy at the wavelength of 13. The Cr grating manufactured by LFAD has advantages of excellent uniformity, low line edge roughness and its pitch value determined directly by nature constants (i. The photoionization of different rare gases was compared at the free-electron laser in Hamburg, FLASH Feb 1, 2021 · Similar extreme ultraviolet (EUV) spectra in the 5. Jun 1, 2007 · We report results on the performance of a free-electron laser operating at a wavelength of 13. Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. 5 nm ± 1 % region where molybdenum/silicon multilayer mirrors exhibit high reflectance (the so May 4, 2023 · The extreme ultraviolet atom probe tomography (EUV APT) project at NIST aims to address some these limitations by improving on the mechanism of thermal field ion evaporation and replacing the fixed-wavelength, ps-pulsed near or deep ultraviolet laser with a wavelength-tunable, femtosecond-pulsed coherent extreme ultraviolet light source. self-traceable). Sep 1, 2022 · Extreme ultraviolet lithography (EUVL) has been demonstrated to meet the industrial requirements of new-generation semiconductor fabrication. 2-nm radiation source for a possible extension of the EUV (Extreme UltraViolet) lithography. The modulation transfer function of the optical system was characterized. Should photon-based lithography We would like to show you a description here but the site won’t allow us. 7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Feb 27, 2023 · A laser pulse surfing in the wake of an electron beam pulse could get upshifted from visible to extreme ultraviolet light, simulations done at the University of Michigan have shown. Rev. Nov 9, 2011 · We demonstrate an efficient extreme ultraviolet (EUV) source for operation at λ = 6. Oct 13, 2022 · Nonlinear optics. Here we show the generation of 58. 4-12 nm Jan 5, 2018 · EUV lithography’s reason for being is that it uses 13. Special thanks are extended to the members of the planning committee listed below. The produced EUV beam has a spatial divergence angle of only 1. 9 nm by a tubular optical element. We have developed a mass spectrometer that uses the focused beam from an extreme ultraviolet laser operating at 46. Analytical probes capable of mapping molecular composition at the nanoscale are of critical importance to materials Aug 1, 2012 · Current challenges in the development of efficient laser produced plasma sources for the next generation extreme ultraviolet lithography (EUVL) are increasing EUV power and maximizing lifetime and therefore, reducing cost of devices. 6 times larger than the 0. 6% BW) CE produced from Jun 22, 2018 · Extreme ultraviolet (EUV) emission from mid-infrared (mid-IR) laser-produced plasmas (LPPs) of the rare-earth element Gd is characterized and the energy conversion efficiency and the spectral purity were higher than for solid-state LPPs at λL = 1. 1 shows two compact EUV laser units built at Colorado State University based on a fast discharge excitation. Dense and intense grating-like fringes with a period of ~150 nm The URL has moved here May 27, 2015 · This work is an important step in the development of the emerging field of solid-state EUV photonics. Borghes1, F. Here, we demonstrate second harmonic generation (SHG) on a table-top XUV source by observing SHG near the Ti M 2,3 Mar 1, 2004 · Narrow-bandwidth, broadly tunable vacuum ultraviolet (VUV) and extreme ultraviolet (XUV) radiation has been generated up to 20 eV by resonance-enhanced four-wave mixing in argon using the five two-photon resonances of argon between 105 000 and 109 000 cm −1 corresponding to the optically accessible fine-structure components of the 3p 5 4p electron configuration. 4 μs in the corresponding time of the laser pulse tail peak. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 10 16 Wcm −2 is measured. Sep 25, 2023 · Free-electron lasers and high-harmonic-generation table-top systems are new sources of extreme-ultraviolet to hard X-ray photons, providing ultrashort pulses that are intense, coherent and tunable. However, the precise definitions of these spectral Mar 1, 1996 · The conversion efficiency of spectral emission from laser‐irradiated solid targets was investigated for short wavelength source development. 9 nm wavelength that is capable to map chemical composition at the nanoscale. These systems are the most compact EUV lasers available at this time. Especially high repetition rate, high photon flux sources are of major interest for reducing acquisition times and improving signal-to-noise ratios in a plethora of applications. Our group is international recognized for the development of advanced ultra-high intensity solid state lasers that are used as drivers of table-top X-Ray and Extreme Ultraviolet (EUV) lasers, and for their applications of these lasers to imaging, patterning, and probing of chemical composition at the nanoscale. The diffraction Mar 18, 2004 · Extreme ultraviolet lithography requires a high-efficiency light source at 13 nm that is free from debris. a Experimental apparatus consisting of a liquid flat microjet and a flat–field spectrometer with a multi-channel plate Mar 6, 2024 · Vacuum- and extreme-ultraviolet combs have only been generated as harmonics of near-infrared femtosecond mode-locked lasers 35, so it is crucial to establish the suitability of such lasers for Jan 19, 2024 · Experiments with self-evolutionary photon sieves. 5nm to match the proposed multilayer optics reflectivity. Laser parameters such as wavelength, pulse length, intensity, and spot size were systematically varied to Jun 7, 2022 · To generate laser with short wavelength is a bottle-neck problem in laser technology. The system generates very high peak intensities, which enable highly nonlinear frequency conversion reaching VUV/XUV energies. The laser output is collimated May 19, 2021 · Abstract. The new line, with initial investment expected to reach USD 6 billion by 2020, will focus on cutting-edge EUV technology considered May 1, 2009 · Exceptional behavior of light-matter interaction in the extreme ultraviolet is demonstrated. Our mass-limited Sn-based laser plasma source shows 1. Using low-enriched uranium fuel pellets that were made by blending two isotopically distinct feedstocks, we show that EUV TOF can map the 235 U/ 238 U content in 100 nm-sized Feb 14, 2022 · The damage mechanism of a nanosecond extreme ultraviolet (EUV) laser with solid targets is complex and involves thermal and nonthermal effects. 3-fs and 12-fs laser pulses are shown in Fig. pulse-seed extreme ultraviolet free-electron laser E. Each of these droplets is hit by one of the 50,000 laser pulses and turned into plasma. Capotondi1, coherent, intense and ultrashort extreme ultraviolet (XUV)/soft X-ray pulses is Feb 5, 2021 · A novel hybrid method that combines the laser-focused atomic deposition (LFAD) and extreme ultraviolet (EUV) interference lithography has been introduced. 5-nm light, which is much closer to the size of the final features to be printed. In our experiment, the EUV radiation is provided by a capillary-discharge 46. 2 nm wavelength with a spatial resolution of 55+/-3 nm. 9 nm (ref 16). Crucially, the conversion efficiency (CE) of 2-µm-laser energy into radiation within a 2% bandwidth centered at 13. Extreme ultraviolet radiation (EUV or XUV) or high-energy ultraviolet radiation is electromagnetic radiation in the part of the electromagnetic spectrum spanning wavelengths shorter that the hydrogen Lyman-alpha line from 121 nm down to the X-ray band of 10 nm. Two electric fields superimpose coherently at a delay time of 0 fs Apr 12, 2020 · Abstract. Laser-driven high-order harmonic generation 1, 2 provides spatially 3 and temporally 4 coherent tabletop sources of broadband extreme-ultraviolet (XUV) light. 7 nm and irradiance levels of thousands of terawatt … Feb 1, 2024 · We demonstrated spectral control of beyond extreme ultraviolet (B-EUV) emission at a central wavelength of 6. Mar 31, 2006 · A simple analytical model is presented for the conversion of laser beam energy into extreme ultraviolet radiation. Sep 18, 2013 · The rapid development of table-top high harmonic generation and free-electron laser (FEL) technologies generating coherent, intense and ultrashort extreme ultraviolet (XUV)/soft X-ray pulses is Aug 30, 2021 · Extreme ultraviolet lithography, or EUV for short, allows a much shorter wavelength of light (13. 5-25. 8% for 2% BW), which is 1. 5 nm relevant for industrial May 17, 2021 · Free-electron lasers producing ultrashort pulses with high peak power promise to extend ultrafast non-linear spectroscopic techniques into the extreme-ultraviolet–X-ray regime. Ultrafast electrons and holes dynamics in Si–Ge alloy under photoexcitation have been captured using extreme ultraviolet light (EUV) transient absorption spectrometry. Its advantage lies in the Mar 31, 2023 · In the present experiment, we report on a new approach to 3D imaging using extreme-ultraviolet radiation. 7 nm where unprecedented peak and average powers for a coherent extreme-ultraviolet radiation source Apr 1, 2024 · Using NIR and ultraviolet (UV) laser pulses, high-order harmonic spectra can be generated in diamond [11]. 2 m 2. Jan 28, 2021 · High-intensity ultrashort pulses at extreme ultraviolet (XUV) and x-ray photon energies, delivered by state-of-the-art free-electron lasers (FELs), are revolutionizing the field of ultrafast Oct 11, 2007 · Extreme ultraviolet lithography (EUVL) was thoroughly reviewed over a broad range of topics, including history, tools, source, metrology, condenser and projection optics, resists, and masks. We present a compact extreme ultraviolet (XUV) source based on high-harmonic generation (HHG) at 2. 54% for 0. 4 nm is produced. With it, manufacturers can turn three or four lithography Apr 16, 2014 · Ultrafast extreme ultraviolet and X-ray free-electron lasers are set to revolutionize many domains such as bio-photonics and materials science, in a manner similar to optical lasers over the past Feb 23, 2018 · Strategically investing to maintain its long-standing leadership in advanced semiconductor technology, Samsung Electronics today broke ground on a new extreme ultraviolet (EUV) technology line in Hwaseong, Korea. These brilliant fourth generation light sources for extreme ultraviolet (XUV; photon energies from a few tens to a few hundreds of eV) and soft x-ray radiation provide intensities that have so far been the domain of optical lasers. A steady-state figure of merit, calculated to optimize emission as a function of laser wavelength, shows an increase May 4, 2007 · Extreme ultraviolet lithography requires a light source at 13. 5 nanometers for industrial use: In a vacuum chamber, a droplet generator shoots 50,000 tiny tin droplets per second. In this method, two EUV pulses hit simultaneously an isolated 3D object from different sides, generating independent coherent diffraction patterns, resulting in two distinct bidimensional views obtained via phase retrieval. Porter, Robert M. 1% under dual 1-μm laser pulse irradiation. The vacuum UV includes the far and extreme UV. Fig. 5 mJ of output energy Dec 2, 2004 · The autocorrelation traces obtained by using 8. Herein, the development of polymeric, single-molecule-resin, and organic-inorganic hybrid EUV photoresists has been The authors thank all participants of the April 2023 extreme ultraviolet (EUV) lithography working group meeting. Jun 18, 2018 · Abstract. e. This debris-free source was used in full-field EUV imaging to obtain magnified images of test samples, ZnO nanofibers and images of the membranes Mar 27, 2023 · Extreme ultraviolet lithography (EUVL) is driving mass production of today's most advanced integrated circuits (ICs). 9 nm laser with copper was investigated. These sources significantly increase the signal-to Mar 30, 2012 · Time evolutions of the plasma temperature and density were found to have an apparent rise at a delay time of 2. Recently, FELs based on the self-amplified Extreme Ultraviolet High-Throughput Spectroscopic Telescope Epsilon Mission (EUVST) will expand how NASA studies the Sun, space, and Earth as an interconnected system and address the recommendations of a July 2017 final report delivered by the multi-agency Next Generation Solar Physics Mission Science Objectives Team. 6% bandwidth (BW) (1. We present a multi-modal tabletop EUV imaging reflectometer for high-fidelity metrology of nanostructures. The orbit radius of these storage rings is 8 cm for the 1–6 MeV machines and 15 cm for the 20 MeV machine. The extreme ultraviolet (EUV) lasers are usually produced with low efficiency by nonlinear multi-photon process. Although their number will grow steadily over the coming decade, their complete characterization remains an elusive goal. We have used the instrument to analyze chemical Apr 16, 2014 · Ultrafast extreme ultraviolet and X-ray free-electron lasers are set to revolutionize many domains such as bio-photonics and materials science, in a manner similar to optical lasers over the past two decades. This suggests that plasma parameters and extreme ultraviolet emission intensity can be controlled by a double pulse combined laser. Sep 30, 2022 · Efficient extreme-ultraviolet high-order wave mixing from laser-dressed silica. A steady-state figure of merit, calculated to optimize emission as a function of laser wavelength, shows an increase Apr 23, 2015 · A mass spectral imaging method is described that exploits the high 3D localization of absorbed extreme ultraviolet laser light and its fundamentally distinct interaction with matter to determine molecular composition from a volume as small as 50 zl in a single laser shot. 5 nm is the main candidate for patterning integrated circuits and reaching sub-10-nm resolution within the next decade. May 11, 2020 · Laser-produced plasma based on the irradiation of tin (Sn) microdroplets by a high-energy ns-pulsed laser. The Dec 1, 2015 · We present a few examples of imaging experiments, which were possible using a compact laser-plasma extreme ultraviolet (EUV) and soft X-ray (SXR) source, based on a double stream gas puff target. 7×1. In order to provide detailed information about Cd structure and gain more insight regarding ionization degrees and types of transition, as well as the understanding of the temporal evolution behavior of laser produced Cd plasmas, extreme ultraviolet spectra of laser-produced cadmium (Cd) plasmas have been measured in the 8. A complete list of speakers and attendees is provided in Appendix A. As a result, it is possible to probe the emission dynamics from a narrow 2D region in the presence of optical fields, as well as obtain elemental specific We report the demonstration of a reflection microscope that operates at 13. Jan 19, 2021 · We use extreme ultraviolet laser ablation and ionization time-of-flight mass spectrometry (EUV TOF) to map uranium isotopic heterogeneity at the nanoscale (≤100 nm). The highest spectral purity (SP) was 5. Jan 25, 2021 · Extreme-ultraviolet (XUV) sources including high-harmonic generation (HHG), free-electron lasers (FELs), soft-X-ray lasers and laser-driven plasmas are widely used for applications ranging from Dec 28, 2015 · Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). 4 mrad, the same as the pump laser. Feb 3, 2021 · The team developed an advanced laser technique that involves exciting nitrophenol with a 400 nanometer-wavelength laser light and then shining very short, very fast pulses of ultraviolet light on Jan 11, 2024 · Allaria, E. 4% attained under single laser pulse irradiation of solid density Mar 1, 2008 · Abstract. Bencivenga1, R. Oct 15, 2023 · Extreme ultraviolet light with a wavelength of 58. 33% (0. Karl, Henry C. Jul 14, 2005 · Extreme ultraviolet (XUV) laser sources today are in a situation rather like that of the laser in 1960. Gardner, Matthew D. The source is based on a laser-produced plasma driven by pulsed radiation of a Nd:YAG laser system. Sep 13, 2018 · Extreme–ultraviolet high–order harmonic generation from liquid samples. High-order harmonic generation (HHG) in gases leads to short-pulse extreme ultraviolet (XUV) radiation that is useful in a number of applications, such as attosecond science and Apr 23, 2015 · Here we describe a mass spectral imaging method that exploits the high 3D localization of absorbed extreme ultraviolet laser light and its fundamentally distinct interaction with matter to determine molecular composition from a volume as small as 50 zl in a single laser shot. Allaria1, F. It will observe the Sun’s different temperatures, simultaneously . Jul 21, 2021 · The extreme-ultraviolet emission intensity as a function of undulator length was measured by disrupting the FEL process with an orbit kick 37, so as to directly verify the exponential Abstract: Generating laser with short wavelength is a bottleneck problem in laser technology. 3b, respectively. To this Dec 18, 2023 · Imaging using coherent extreme-ultraviolet (EUV) light provides exceptional capabilities for the characterization of the composition and geometry of nanostructures by probing with high spatial resolution and elemental specificity. Hard x-rays, soft x-rays, extreme ultraviolet (EUV) radiations, and far-infrared (FIR) radiations are generated by a tabletop electron storage ring of electron energies 1, 4, 6, and 20 MeV. 8 nm do not meet some applications. May 4, 2017 · Coherent extreme-ultraviolet (EUV)/x-ray laser sources, structured in their temporal/spectral, spatial and angular momentum properties are emerging as unique tools to probe the nanoworld. 1 a) is a “table top” laser whose head has a footprint approximately 0. 4 MHz pulse repetition rate driven from the compressed output of a mode-locked thin-disk laser (TDL) oscillator. 9 nm is both simulated and measured to be higher than 90% with a slight optical aberration. Arrival time fluctuations of extreme-ultraviolet (EUV) pulses from the free-electron laser in Hamburg (FLASH) are measured single-pulse resolved at the experimental end-station. Jan 28, 2019 · Laser-dressed photoelectron spectroscopy, employing extreme-ultraviolet attosecond pulses obtained by femtosecond-laser-driven high-order harmonic generation, grants access to atomic-scale Our Program. The development of high-power EUV sources is a long-term critical challenge to the implementation of EUVL in high-volume manufacturing (HVM), together with other technologies such as photoresist and mask. The generation process is a single photon process, and the photon conversion efficiency is 7. 5 nm wavelength range and underlying plasma ionicities are obtained when the intensity ratio is kept fixed at I 1µm /I 2µm = 2. Photon 6, 699–704 (2012). Adams. The model is compared with experimental results to show good agreements under different conditions of the laser wavelength λ L ⁠, the laser intensity S L ⁠, the pulse duration t L ⁠, and the target atomic number Z 0 ⁠. In the EUVL process, the best way to produce extreme ultraviolet light is laser-produced plasma (LPP) [], that is, a high-power, high repetition frequency, narrow-pulse width CO 2 laser is used to bombard a droplet tin-target, which is filtered and collected to produce 13. Mar 29, 2004 · We demonstrate the applicability of liquid-metal jets in vacuum as regenerative targets for laser-plasma generation of extreme ultraviolet (EUV) and soft x-ray radiation. Dec 3, 2023 · Electrons photoemitted by extreme ultraviolet attosecond pulses derive spatially from the first few atomic surface layers and energetically from the valence band and highest atomic orbitals. The operating principle of the tubular element for focusing and wavefront splitting is discussed. An analytical formula for maximizing radiation efficiency from a laser-produced plasma is derived. Nat. These sources typically Jan 30, 2020 · Double ionization of helium by a single intense (above 10 18 W / cm 2) linearly polarized extreme ultraviolet laser pulse is studied by numerically solving the full-dimensional time-dependent Schrödinger equation. Extreme ultraviolet (EUV) high-harmonic radiation1,2 emerging from laser-driven atoms Apr 1, 2024 · Using NIR and ultraviolet (UV) laser pulses, high-order harmonic spectra can be generated in diamond [11]. Oct 31, 2016 · We report on the development of a high brightness source of extreme ultraviolet radiation (EUV) with a working wavelength of 13. Mar 18, 2015 · Extreme ultraviolet (EUV) lithography at 13. Emission spectra from the source were obtained to observe the effects of Sn concentration and effects of laser intensity. This extends the operation of liquid-jet laser-plasma sources to high-temperature, high- Z, high-density, low-vapor-pressure materials with new spectral signatures. Here, an XUV source based on cascaded frequency conversion is presented, which, due to the drastic better single atom Apr 24, 2009 · Exceptional behavior of light-matter interaction in the extreme ultraviolet is demonstrated. The dependence of the radiation efficiency on the plasma density is confirmed by experiments using a Jun 28, 2021 · An international team of researchers has demonstrated a new concept for the generation of intense extreme-ultraviolet (XUV) radiation by high-harmonic generation (HHG ). Abstract. The term vacuum UV (below ≈ 200 nm) refers to the wavelength range where a vacuum apparatus is often used because the light is strongly absorbed in air. Liquid droplets of Sn-In eutectic alloy were used as the source fuel. Elisabeth R. The lack of available table-top extreme ultraviolet (XUV) sources with high enough fluxes and coherence properties has limited the availability of nonlinear XUV and x-ray spectroscopies to free-electron lasers (FELs). Early lasers were no use for high-resolution spectroscopy as bandwidths were too wide. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0. Seaberg, Christina L. The plasma brightness was quantified using absolutely calibrated detectors for 20 materials and spectra were obtained between 50 and 200 A. The EUV laser generates pulses of ∼ 10 μJ energy, 1. The current applicable table top extreme ultraviolet (EUV) lasers are all generated by multi-photon process, with low efficiency and the record short wavelength of 113. 5 ns duration at a wavelength of λ=46. In this study, the interaction process of a nanosecond 46. This hot and dense plasma contains highly charged ions to generate extreme ultraviolet Jul 1, 2010 · Compact table top EUV lasers. 4 × 10 −5 which is higher than that of HHG lasers. Murnane, and Daniel E. The emission of high-order harmonics from solids \cite {ghimire11a,schubert14a,luu15a,golde08a} under intense laser-pulse irradiation is revolutionizing our understanding of strong-field solid-light interactions \cite {ghimire11a,schubert14a,luu15a,vampa15b May 4, 2007 · Extreme ultraviolet lithography requires a light source at 13. May 29, 2023 · A capillary discharge extreme ultraviolet laser is focused and wavefront split at 46. 2% conversion efficiency. It doubled compared to a value of 2. The microscope uses illumination from a tabletop extreme ultraviolet laser to acquire aerial images of photolithography masks with a 20 s exposure time. Highly coherent and stable pulses from the FERMI seeded free-electron laser in the extreme ultraviolet. For the laser intensities well beyond the perturbative limit, novel gridlike interference fringes are found in the correlated Extreme ultraviolet (XUV) lasers are essential for the investigation of fundamental physics. 3a and Fig. Feb 23, 2023 · Capturing transient core-to-core resonances in Kr in intense extreme-ultraviolet laser fields by electron-ion coincidence spectroscopy Mizuho Fushitani, Makoto Yamada, Hikaru Fujise, Shigeki Owada, Tadashi Togashi, Kyo Nakajima, Makina Yabashi, Akitaka Matsuda, Yasumasa Hikosaka, and Akiyoshi Hishikawa Phys. The maximum efficiency is achieved when the plasma expansion distance during laser heating is equal to the laser absorption length. Since 1988, many studies on EUVL have been conducted in North America, Europe, and Japan, through state sponsored programs and industrial consortiums. 76 nm from a gadolinium (Gd) laser-produced plasma. Feb 2, 2024 · A reflective spatial light modulator for extreme ultraviolet (EUV) or soft X-ray light is demonstrated in an electronic Wigner crystal material with a sub-90-nm feature size. A Faraday cup was used to measure the electron signals induced by the laser irradiation. The first unit ( Fig. The approach could enable more efficient generation of high-energy laser light, perhaps even to X-rays. Jan 14, 2005 · Abstract. et al. 5 nm. Kapteyn, Margaret M. 4 nm laser by a single-photon-excitation related stimulated anti-Stokes Raman scattering (ASRS) with an efficiency higher than that of high harmonic generation Sep 23, 2012 · Free-electron lasers (FELs) are promising devices for generating light with laser-like properties in the extreme ultraviolet and X-ray spectral regions. 06 μm. UVA stands for the range from 320 to 400 nm, UVB for 280–320 nm, and UVC for 200–280 nm. Feb 20, 2015 · We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. Key aspects are ASML, Zeiss, and TRUMPF joined forces to develop a technology to produce extreme ultraviolet (EUV) light with a wavelength of 13. 5 nm extreme ultraviolet monochromatic light [7,8,9]. The impact of wavelength and power density on the ion distribution and electron temperature in a laser-produced plasma is calculated for Nd:YAG and CO2 lasers. It Nov 1, 2007 · Xe laser-produced plasma with a gas-jet target is considered a promising λ = 11. The approach Apr 23, 2015 · The EUV MSI instrument is schematically shown in Fig. Shanblatt, Bosheng Zhang, Dennis F. Jan 22, 2013 · A few years ago, a new era of intense free-electron lasers (FELs) began. 4 (7). 9-nm laser operating in single-shot mode with 0. This is because the short wavelength laser light can be focused to spots of about 120 nm diameter. 1c. 5 nanometers) to be used, compared with deep ultraviolet, the previous lithographic method (193 High Numerical Aperture Reflection Mode Coherent Diffractive Imaging of Nano-Patterned Surfaces using a Tabletop Extreme Ultraviolet Source. 1,2 Crucial to the success of this technology has been the development of a sufficiently powerful, stable, and “clean” source of EUV radiation 3 concentrated in a narrow 13. og sp cc yg cq se jb ew sd me